Modeling of Production Scale Reactive Deposition of a Cylindrical Magnetron

摘要

A modified version of the standard model for reactive sputtering (Berg et al.) has been developed that incorporates the atomic sputtering process from a reacted target, and incorporates the effects of tube rotation. The model presented here assumes that individual atoms, not compound molecules, are sputtered. This change has only a small effect on the predictions of the model if only two stoichiometries are considered, but it allows multiple stoichiometries to be self-consistently calculated. In this paper we make comparisons of the model to measured parameters from a BOCCT Rotatable C-Mag cathode. The target material is titanium, and the model assumes areas on the target and substrate of Ti, TiO, TiO_2 and TiO_3. Comparisons are made with the measured sputter rate throughout the hysteresis curve at three tube rotation rates.