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CHARACTERIZATION AND GAS SENSING PROPERTIES OF NIO THIN FILMS

机译:NIO薄膜的表征及气体传感性能

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We present the results concerning the characterisation of nickel oxide thin films deposited by dc reactive magnetron sputtering. Different NiO thin films have been prepared by changing some deposition parameters, as the oxygen content in the reactive plasma and the sputtering mode (metal- or oxide-sputtering mode). The structure and surface morphology of the samples have been analysed by XRD and AFM respectively. Gas sensing tests to NO_2 in the range 1/10 ppm and to CO in the range of 50/200 ppm at different temperatures (25/4420°C) have been carried out. A set of NiO films have been also surface modified by Pt and good response to H_2 have been obtained.
机译:我们介绍了DC反应磁控溅射沉积的氧化镍薄膜特征的结果。通过改变一些沉积参数,作为反应等离子体中的氧含量和溅射模式(金属或氧化物 - 溅射模式)来制备不同的NiO薄膜。样品的结构和表面形态分别通过XRD和AFM分析。对NO_2的气体传感试验在0/10ppm和CO范围内进行,在50/200ppm的不同温度(25/4420°C)的范围内进行。通过PT改变了一组NiO膜,并获得了对H_2的良好反应。

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