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A Physical Alpha-Power Law MOSFET Model

机译:物理阿尔法功率定律MOSFET模型

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摘要

A new compact physics-based Alpha-Power Law MOSFET Model is introduced to enable projections of low power circuit performance for future generations of technology by linking the simple mathematical expressions of the original Alpha-Power Law Model with their physical origins. The new model, verified by HSPICE simulations and measured data, includes: 1) a subthreshold region of operation for evaluating the on/off current trade-off that becomes a dominant low power design issue as technology scales, 2) the effects of vertical and lateral high field mobility degradation and velocity saturation, and 3) threshold voltage roll-off. Model projections for MOSFET CV/I indicate a 2X-performance opportunity compared to NTRS extrapolations for the 250, 180, and 150nm generations subject to maximum leakage current estimates of the roadmap. NTRS and model calculations converge at the 70nm technology generation, which exhibits pronounced on/off current interdependence for low power gigascale integration (GSI).
机译:引入了一种新的基于物理的紧凑型Alpha-幂定律MOSFET模型,通过将原始Alpha-Power定律模型的简单数学表达式与它们的物理起源联系起来,可以为下一代技术提供低功率电路性能的预测。经过HSPICE仿真和测量数据验证的新模型包括:1)一个亚阈值工作区域,用于评估开/关电流折衷,随着技术规模的发展,该折衷成为低功耗设计的主要问题; 2)垂直和垂直效应横向高场迁移率下降和速度饱和,以及3)阈值电压滚降。 MOSFET CV / I的模型预测表明,与250nm,180nm和150nm世代的NTRS外推法相比,该路线图的性能提高了2倍,这取决于该路线图的最大漏电流估算。 NTRS和模型计算在70nm技术世代汇聚,对于低功耗千兆级集成(GSI)而言,其开/关电流相互依存性强。

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