首页> 外文会议>International conference on silicon carbide, III-nitrides and related materials;ICSCIII-N'97 >Studies of the Ambient Dependent Inversion Capacitance of Catalytic Metal - Oxide - Silicon Carbide Devices Based on 6H- and 4H-SiC Material
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Studies of the Ambient Dependent Inversion Capacitance of Catalytic Metal - Oxide - Silicon Carbide Devices Based on 6H- and 4H-SiC Material

机译:基于6H和4H-SiC材料的催化金属-氧化物-碳化硅器件的环境依赖反转电容的研究。

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摘要

Platinum - oxide - silicon carbide structures change their capacitance upon gas exposure and are used as gas sensors. The decrease of the inversion capacitance within 750 to 900 deg C due to hydrogen exposure is studied for 4H- and 6H-SiC, both n- and p-type. A mechanism for the capacitance decrease is suggested which explains also the large change in the conductance of the structures.
机译:铂-氧化物-碳化硅结构在暴露于气体后会改变其电容,并用作气体传感器。对于4H型和6H型SiC(n型和p型),研究了由于氢暴露而导致的750至900℃内反向电容的减小。提出了减小电容的机制,这也解释了结构电导的巨大变化。

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