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Electron irradiated LPE grown AlGaAs/GaAs tandem solar cells

机译:电子辐照的LPE生长的AlGaAs / GaAs串联太阳能电池

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Effect of irradiation on the LPE-grown Al sub 0.35 Ga SUB 0.65 As/GaAs monolithic tandem solar cells have been studied. Electron beam induced current method was used for investigation of the minority carrier diffusion length degradation after electron irradiation. The L sub p value of 18 mum in undoped n-GaAs was obtained before irradiation. The EOL L sub p=4 mum was obtained after 3.75 MeV electron irradiation to a fluence of 3*10 sup 15 cm sup -2. A low radiation damage coefficient K sub L=2*10 sup -9 has been extracted through these experiments. The optimum p-Al sub 0.35Ga sub 0.65 As layer thickness of 0.3-0.5 mum ensures the best radiation resistance of the top Al sub 0.35 Ga sub 0.65As - based subcell. The optimum p-GaAs emitter layer thickness of 0.3 mum and the minimum doping level in n-GaAs base are the conditions for the best radiation resistance of the bottom GaAs subcell. The remaining factors of photocurrent I sub SC/I sub SCO=0.87 and of efficiency P sub max/P sub 0=0.71 have been obtained in the bottom cells based on undoped GaAs after 3.75 MeV electron irradiation at displacement damage dose of 2*10 sup 11 MeV/g.
机译:研究了辐照对LPE生长的Al sub 0.35 Ga SUB 0.65 As / GaAs整体串联太阳能电池的影响。用电子束感应电流法研究了电子辐照后少数载流子扩散长度的下降。在辐照前,未掺杂的n-GaAs中的L sub p值为18 m。在3.75 MeV电子辐照至3×10 sup 15 cm sup -2的通量后,获得EOL L sub p = 4。通过这些实验已经提取出低的辐射损伤系数K sub L = 2 * 10 sup -9。最佳的p-Al sub 0.35Ga sub 0.65 As层厚度为0.3-0.5μm,可确保基于Al Al 0.35 Ga sub 0.65As的子电池具有最佳的抗辐射性能。最佳的p-GaAs发射极层厚度为0.3μm,n-GaAs基极中的最低掺杂水平是底部GaAs子电池具有最佳抗辐射性的条件。在3.75 MeV电子辐照下,在位移损伤剂量为2 * 10的条件下,基于未掺杂的GaAs,在底部电池中获得了光电流I sub SC / I sub SCO = 0.87和效率P sub max / P sub 0 = 0.71的剩余因子。 sup 11 MeV / g。

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