Recent developments in the underbalanced closed field sputtering system

摘要

Using an improved deisgn of the unbalanced mangetron in the patented closed foekd arrangement results in exception-ally high ion current densities at the substrates during both ion cleaning and deposition. This has resulted in the development of advanced MoS_2 and DLC coatings. The improvenon finger printing coatings to be deposited onto plastic substrates.