Measuring critical dimensions and overlays as prescribed by the National Technology Roadmap for Semiconductors

摘要

Abstract: Continued demands on shrinking features with tighter tolerance on critical dimensions (CDs) and overlays (OL) are placing stringent requirements on parameters that are essentially the building blocks of the metrologies for CDs and overlays. This paper conducts a reality check on the precision and error budgets assigned to CD and overlay controls by the National Technology Roadmap for Semiconductors (NTRS) in light of constraints on parameters that are fundamental to the above measurements. !3