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Subsurface damage and polishing compound affect the 355-nm laser damage threshold of fused silica surfaces

机译:次表面损伤和抛光剂会影响熔融石英表面的355 nm激光损伤阈值

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Abstract: Subsurface damage, namely grinding and polishing fractures or scratches hidden by the polishing redeposition layer, may lower laser damage threshold by reducing fracture strength, providing sites for absorbing contaminants, and modulating the electromagnetic field. Polishing compound may affect 355-nm laser damage by absorption and scratching. Fused silica surfaces were finished with different grinding and polishing removal depths to leave different extents of subsurface damage from grinding. Three surfaces were polished with ceria and three with zirconia. The surfaces were 355-nm laser damage tested using an automated 'R-on-1' protocol, and also characterized for surface roughness, subsurface damage as revealed by etching, and total internal reflectance microscopy (TIRM). The zirconia polishing produced the highest laser thresholds, especially when the surface was free of polishing and grinding damage. The zirconia polishing was prone to damaging the surface, which significantly reduced laser thresholds at some sites. the ceria polishing left very little polishing damage, and showed uniform damage thresholds when there was no subsurface damage from grinding present. Residual Blanchard fractures lowered thresholds dramatically. Subsurface fractures from fine loose grinding sometimes reduced threshold dramatically and sometimes very little. TIRM images correlate fairly well with microphotographs of subsurface damage revealed by etching. !15
机译:摘要:表面损伤,即由抛光再沉积层掩盖的研磨和抛光裂缝或划痕,可能会通过降低断裂强度,提供吸收污染物的位置和调制电磁场来降低激光损伤阈值。抛光剂可能会因吸收和刮擦而影响355 nm激光损伤。用不同的研磨和抛光去除深度对熔融石英表面进行精加工,以留出不同程度的研磨造成的次表面损伤。用氧化铈对三个表面进行抛光,用氧化锆对三个表面进行抛光。使用自动化的“ R-on-1”协议对表面进行了355 nm激光损伤测试,并对表面粗糙度,通过蚀刻显示的亚表面损伤和全内反射显微镜(TIRM)进行了表征。氧化锆抛光产生最高的激光阈值,尤其是当表面没有抛光和研磨损伤时。氧化锆抛光容易损坏表面,从而显着降低了某些位置的激光阈值。二氧化铈抛光几乎没有留下抛光损伤,并且当不存在因研磨而引起的地下损伤时,均显示出均匀的损伤阈值。布兰查德残余骨折大大降低了阈值。精细疏松磨削产生的地下裂缝有时会大大降低阈值,有时很小。 TIRM图像与通过蚀刻揭示的地下损伤的显微照片具有很好的相关性。 !15

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