Fabrication of cold light mirror of film projector by direct electron-beam-evaporated TiO2 and SiO2 starting materials in neutral oxygen atmosphere

摘要

This paper introduces a process suitable to applied production of a cold light mirror of a film projector on a large scale. Deposition parameters required for producing a TiO$-2$//SiO$-2$/ optical multilayer systems by electron beam evaporation of TiO$-2$/ and SiO$-2$/ starting materials are investigated. Manufacture and techniques of a cold mirror and the adhesion, stability, wear, and corrosion resistance of a cold mirror by this process are discussed. The results show that cold mirrors have good optical properties and better adhesion.