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ODmr Investigations ofGe Acceptors in p-Type Al sub 0.4Ga sub 0.6As

机译:p型Al sub 0.4Ga sub 0.6As中Ge受体的ODmr研究

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P-Type Ge-doped Al sub 0.4Ga sub 0.6As layers grown by liquid Phase epitaxy have bee nstudied with near infrared optical absorpton and electron parmagnetci resonance detected via the magnetic circular dichrism of the absorption. A broad MCDA band has been observed in the same spectral region ad a photolionization absorption band. The MCDA-EPR spectrum reveasled an anisotropic and asymmetric line with a g-factor for B [100], a half width deltaB sub 1/2=60mT, a spin-lattice relaxation time T sub 1(1.5K)=5+ and -2ms and S=1/2. The anisotropy of the MCDA-EPR line shows that the symmetry is lower than tetrahedral. In addition, we observed a second weaker EPR line, with a very short T sub 1 at 1.5K and an naomalously broadend linewidth. For the origin of these two defects we propose a model in which the neutral. Paramagnetic Ge-acceptro induces either shallow EMT or deep levels. While the deep acceptor has its symetry lowered by the alloy disorder, the shaalow level is thought to be equivalent to the Ge acceptor in GaAs.'
机译:研究了通过液相外延生长的P型Ge掺杂的Al sub 0.4Ga sub 0.6As层,并通过吸收的磁圆二分法检测到了近红外光吸收和电子顺磁共振。在相同的光谱区域中观察到较宽的MCDA谱带和光离子化吸收谱带。 MCDA-EPR谱图显示了一个各向异性的,不对称的谱线,其g因子为B [100],半宽deltaB sub 1/2 = 60mT,自旋晶格弛豫时间T sub 1(1.5K)= 5 +, -2ms和S = 1/2。 MCDA-EPR线的各向异性表明,其对称性低于四面体。此外,我们观察到第二条较弱的EPR线,Tsub 1在1.5K处非常短,并且线宽异常宽。对于这两个缺陷的起源,我们提出了一个中性的模型。顺磁性Ge受体诱发浅的EMT或深的水平。尽管深受体的对称性因合金紊乱而降低,但shaalow含量被认为与GaAs中的Ge受体相当。

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