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A model of dielectric plasma columns in silicon surface barrier detectors

机译:硅表面势垒检测器中的介电等离子体柱模型

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For a comprehensive understanding of the energy and timing responses of silicon surface barrier detectors (SSBDs), a model of dielectric plasma columns is proposed. The electric properties of a plasma column are assumed to change from those of a conductor to a dielectric, as the electron-hole pair density of the plasma column decreases. The time duration of conducting plasma column is regarded as the plasma delay; the time retardation between heavy ion incidence and its detector output. The electric field strengths inside the depletion layer of SSBDs are shown with a dielectric plasma column, which explain the dependence of the plasma delay on the resistivity of SSBDs. The change of the electric field strength during the charge collection process in the depletion layer of the SSBD is essential to explain the residual defect (which was previously explained as recombination defect of electrons and holes) in the pulse height defect; the non-linearity between the energy of incident heavy ion and its pulse height. Calculated results for the plasma dealy and the resuidual defect based on the present model show good agreement with experimental results of other workers and of the present author for heavy ions such as ~4He, ~(16)O, ~(40)Ar, and ~(58)Ni.
机译:为了全面了解硅表面势垒检测器(SSBD)的能量和时序响应,提出了电介质等离子体柱模型。假定随着等离子体柱的电子-空穴对密度降低,等离子体柱的电性能从导体的电性能改变为电介质。进行等离子柱的持续时间被认为是等离子延迟。重离子入射与其检测器输出之间的时间延迟。 SSBD耗尽层内部的电场强度用电介质等离子体柱显示,这解释了等离子体延迟对SSBD电阻率的依赖性。 SSBD耗尽层中电荷收集过程中电场强度的变化对于解释脉冲高度缺陷中的残余缺陷(先前解释为电子和空穴的复合缺陷)至关重要。入射重离子的能量与其脉冲高度之间的非线性关系。基于本模型的等离子体处理和残余缺陷的计算结果与其他工人和本作者针对重离子(例如〜4He,〜(16)O,〜(40)Ar和〜(58)镍。

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