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A WAFER LEVEL VIBRATION TEST SYSTEM FOR MEMS ACCELEROMETER SENSITIVITY MEASUREMENT AND CALIBRATION

机译:用于MEMS加速度计灵敏度测量和校准的晶片级振动测试系统

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Sensitivities of microelctromechanical system (MEMS) accelerometers are typically measured and calibrated at final production test of packaged devices. This process typically requires expensive special automated test equipment (ATE) that can generate vibration stimulus. A single-axis vibration test system has been developed on an existing commercial wafer probe/trim system to calibrate sensitivities of MEMS accelerometers during wafer probe/trim process to minimize the need for such vibration test equipment. To increase signal to noise ratio but avoid damage of probe pad/pin during the test, the vibration exciter must be able to generate high frequency but small displacement vibration stimulus. The vibration exciter also needs to be small enough to fit into the existing commercial probe/trim system and requires minimum changes to the system. A high resolution but small size in-situ noncontact vibration measurement technique is needed to ensure calibration accuracy. This paper presents a unique solution to meet all these challenges. The success of this system has been validated by final product test data of a test device, a 3-axis low-g MEMS accelerometer.
机译:通常在封装装置的最终生产测试中测量和校准微闭电机械系统(MEMS)加速度计的敏感性。该过程通常需要昂贵的特殊自动化测试设备(ATE),可以产生振动刺激。在现有的商业晶圆探头/装饰系统上开发了单轴振动测试系统,以在晶片探头/修剪过程中校准MEMS加速度计的灵敏度,以最大限度地减少对这种振动测试设备的需求。为了增加信噪比,但避免在测试期间损坏探针/引脚,振动激励器必须能够产生高频但小的位移振动刺激。振动激励器还需要足够小以适合现有的商用探针/修剪系统,并且需要对系统的最小变化。需要高分辨率但小尺寸的原位非接触式振动测量技术,以确保校准精度。本文提出了一个独特的解决方案,以满足所有这些挑战。该系统的成功已被测试装置的最终产品测试数据验证,3轴低G MEMS加速度计。

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