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A high intensity electron beam ion trap for charge state boosting of radioactive ion beams

机译:用于增强放射性离子束电荷态的高强度电子束离子阱

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A high intensity electron beam ion trap under development at LLNL could be adapted for charge state boosting of radioactive ion beams, enabling a substantial reduction in the size and cost of a post-accelerator. We report estimates of the acceptance, ionization time, charge state distribution, emittance, and beam intensity for charge state boosting of radioactive ions in this device. The estimates imply that, for tin isotopes, over 10~(10) ions/s can be ionized to q chemical bounds 40+ with an aboslute emittance of approximately 1 pi mm mrad at an energy of 30xq keV.
机译:LLNL正在开发的高强度电子束离子阱可以适用于增强放射性离子束的电荷态,从而可以大幅减少后加速器的尺寸和成本。我们报告了该装置中放射性离子的电荷增强状态的接受度,电离时间,电荷态分布,发射率和束强度的估计值。估计表明,对于锡同位素而言,在30xq keV的能量下,可以将超过10〜(10)离子/ s离子化为q个化学键40+,具有约1 pi mm mrad的纯净发射率。

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