首页> 外文会议>Conference on optical sensors >Experimental performances and Monte Carlo modelling of LWIR HgCdTe avalanchephotodiodes
【24h】

Experimental performances and Monte Carlo modelling of LWIR HgCdTe avalanchephotodiodes

机译:LWIR HGCDTE Avalanchephydiodes的实验性能和Monte Carlo建模

获取原文
获取外文期刊封面目录资料

摘要

We report the performances of LWIR (X, = 9.0 pm at 80K) HgCdTe electron injectedavalanche photodiodes (e-APD). In these devices, the exponential gain curve, up to gainsequal to 23 at 100K, and the low excess noise factor close to unity (F 1-1.25) are indicativeof a single carrier multiplication process, which is electron impact ionization. The darkcurrent is mainly due to a diffusion current at low reverse bias and tunneling currents at highreverse bias. A Monte Carlo model has been developed for understanding the multiplicationprocess in Hgi_xCd,Te e-APDs. We find a good agreement between first simulation resultsand experimental measurements of the gain and the excess noise factor in both MWIR (x =0.3) and LWIR (x = 0.235) e-APDs at 80K. Furthermore, simulations do not show any heavyhole impact ionization. This model which enables to perform phenomenological studies aimsat identifying the main physical and technological parameters that influence the gain and theexcess noise. In the present work, it is used to study the influence of the thickness of the n-doped region on the gain and the excess noise factor. We found that F still decreases while thethickness of the n- layer decreases. However, an optimum thickness of the n- layer existsaround 1pm in terms of gain-voltage characteristic.
机译:我们报告了LWIR(x,= 9.0pm处的80k)Hgcdte电子注入的性能(E-APD)的性能。在这些装置中,指数增益曲线,最高到10k的衰减为23,以及接近Unity(F 1-1.25)的低过量噪声系数是指示单载波乘法过程,其是电子碰撞电离。暗电流主要是由于高反向偏置和高偏压的隧道电流的扩散电流。已经开发了一个Monte Carlo模型,用于了解HGI_XCD中的乘法处理,TE E-APD。我们在80K时在MWIR(X = 0.3)和LWIR(X = 0.235)E-APD中的第一个模拟结果变为对增益的实验测量和过量噪声系数之间的良好一致性。此外,模拟不显示任何重型抗冲击电离。该模型能够执行现象学研究Aimsat识别影响增益和噪音的主要物理和技术参数。在本作工作中,它用于研究N掺杂区域厚度对增益和过量噪声系数的影响。我们发现F仍然减少,而N层的透明度降低。然而,就增益电压特性而言,N层的最佳厚度存在下列1PM。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号