首页> 外文会议>IEEE Applied Power Electronics Conference and Exposition >Monolithic Integration of a 5-MHz GaN Half-Bridge in a 200-V GaN-on-SOI Process: Programmable dv/dt Control and Floating High-Voltage Level-Shifter
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Monolithic Integration of a 5-MHz GaN Half-Bridge in a 200-V GaN-on-SOI Process: Programmable dv/dt Control and Floating High-Voltage Level-Shifter

机译:200 V Gan On-SOI工艺中5 MHz GaN半桥的单片集成:可编程DV / DT控制和浮动高压电平移位器

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This paper presents key building blocks of a monolithic GaN half-bridge solution: 1) a binary-weighted digitally-controlled segmented gate-driver, offering slew-rate control; 2) a high-voltage floating level-shifter with glitch prevention; and 3) a monolithic half-bridge with integrated fixed-strength gate-drivers. Together, they facilitate on-chip active gate-driving, improving the reliability of GaN power ICs. The blocks were fabricated on separate dies using imec’s 200 V GaN-on-SOI process. A controllable dvDS/dt from 68 V/ns to 112 V/ns at room temperature is achieved using the segmented gate-driver. An oscillation-free vDS switching of the half-bridge at 200 V and 5 MHz is demonstrated through experimental results.
机译:本文介绍了单片GaN半桥解决方案的关键构建块:1)二进制加权的数字控制分段栅极 - 驾驶员,提供摆率控制; 2)具有故障防护的高压浮电平换档器; 3)具有集成固定强度栅极驱动器的单片半桥。 它们共同促进了片上主动栅极驾驶,提高了GaN电力IC的可靠性。 使用IMEC 200 V Gan-On-SOI工艺在单独的模具上制造块。 可控的DV. DS 使用分段的栅极驱动器实现室温下的68 V / NS至112 V / NS。 无振荡v DS 通过实验结果证明了200 V和5 MHz的半桥的切换。

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