首页> 外文会议> >Comparison of Si, GaAs, SiC AND GaN FET-type switches for pulsed power applications
【24h】

Comparison of Si, GaAs, SiC AND GaN FET-type switches for pulsed power applications

机译:脉冲功率应用中Si,GaAs,SiC和GaN FET型开关的比较

获取原文

摘要

Among the present limitations on the peak voltage of traditional Si-MOSFET switches are fundamental materials properties that are related both to intrinsic properties (such as bandgap), and to defects. Switches fabricated from semiconductors such as GaAs, SiC and GaN hold promise if hold-off voltages of several kilovolts and fast rise rates are needed. High power and short pulse (> 1/spl mu/s) applications require both fast switching speed and great current handling capability. The question arises whether any single material has all of these desired properties or whether there are intrinsic limitations. In order to investigate this, we have performed simulations of the electrical properties of FET-type switches fabricated from each of these materials. Both perfect material properties and the effects of defects have been included. The simulation results show that deep level defects degrade the device performance. Based on our simulations and on the available data, in the near term, 4H-SiC is the most attractive of the four materials for pulsed power applications.
机译:目前对传统Si-MOSFET开关的峰值电压的限制包括与固有特性(例如带隙)和缺陷都相关的基本材料特性。如果需要几千伏的释抑电压和快速上升的速率,则用GaAs,SiC和GaN等半导体制成的开关具有广阔的前景。大功率和短脉冲(> 1 / spl mu / s)应用需要快速的开关速度和强大的电流处理能力。出现的问题是,任何一种材料是否都具有所有这些所需的特性,或者是否存在固有的局限性。为了对此进行研究,我们对由这些材料制成的FET型开关的电性能进行了仿真。完美的材料性能和缺陷影响都包括在内。仿真结果表明,深层缺陷会降低器件性能。根据我们的模拟和现有数据,在短期内,4H-SiC是四种用于脉冲功率应用的材料中最具吸引力的材料。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号