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UV, blue, green, yellow-green and white LEDs fabricated by III-N semiconductors

机译:由III-N半导体制造的UV,蓝色,绿色,黄绿色和白色LED

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Recent achievements in GaN-based light-emitting diodes (LEDs), which is linked to the use of new designs, such as p/sup +/-AlGaN/GaN strained-layer superlattice (SLS) and n/sup +/-InGaN/GaN short-period superlattice (SPS) top contact layer is reported. GaN-based LEDs with low-operation voltages, which are as low as 3 V (at 20 mA ) even lower, can be achieved by the use of these heavy-doped layers. In addition, conventional transparent conductive oxide, such as indium tin oxide (ITO), can be served as a transparent top contact layer in GaN-based LEDs other than thin metal film such as Ni/Au. Luminescence intensity in visible GaN-based LEDs can be significantly improved by this new design due to the high-transparency top contact layer. In the recent achievements, white LEDs including a variety of designs, such as phosphor-containing and phosphor-less device structures, will also be reported. Specifically, the high-efficiency yellow-green (/spl lambda//spl sim/565 nm) LEDs based on InGaN/GaN MQW emitting layers, which the luminescence intensity is comparable with the conventional AlGaInP yellow-green (/spl lambda//spl sim/575 nm) LEDs is achieved. This high-efficiency InGaN/GaN yellow-green LED makes a single-chip complementary white LED possible.
机译:基于GaN的发光二极管(LED)的最新成就,这与使用新设计有关,例如p / sup +/- AlGaN / GaN应变层超晶格(SLS)和n / sup +/- InGaN报告了/ GaN短周期超晶格(SPS)顶部接触层。通过使用这些重掺杂层,可以实现具有低工作电压的GaN基LED,该低工作电压甚至低至3 V(在20 mA时)。另外,除了诸如Ni / Au的金属薄膜之外,常规的透明导电氧化物,例如铟锡氧化物(ITO),可以用作GaN基LED中的透明顶部接触层。由于具有高透明度的顶部接触层,因此通过这种新设计可以显着提高可见光GaN基LED的发光强度。在最近的成就中,还将报道包括各种设计的白色LED,例如含磷和无磷的器件结构。具体而言,基于InGaN / GaN MQW发射层的高效黄绿色(/ splλ// spl sim / 565 nm)LED,其发光强度可与常规AlGaInP黄绿色(/ splλ//实现了spl sim / 575 nm)LED。这种高效的InGaN / GaN黄绿色LED使得单芯片互补白光LED成为可能。

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