MOSFET; ion implantation; oxidation; hot carriers; asymmetric graded low doped drain; vertical channel nMOSFET; AGLDD structure; ion implantation; impurity diffusion; short channel effects; hot carrier effect; SWAM LOCOS isolation; sidewall gate capacitances; fabrication process; planar CMOS technology; DC characteristics;
机译:具有不对称渐变轻掺杂漏极的垂直沟道nMOSFET
机译:具有梯度沟道掺杂的垂直nMOSFET改善了热载流子和短沟道性能
机译:减少侧向渐变沟道掺杂分布的0.1- / splμ/ m嵌入式沟道nMOSFET中热载流子的产生
机译:一种新型不对称渐进的低掺杂漏极(AGLDD)垂直通道NMOSFET,侧壁掩盖(SAMAM)LOCOS隔离
机译:对不对称加热垂直通道中跨块安装板的混合对流和传热的分析。
机译:信道掺杂浓度对不对称双栅MOSFET降低漏极诱导屏障的依赖性