Computation of capacitance matrix of integrated-circuit interconnects using on-surface MEI method

摘要

The on-surface MEI (OSMEI) method is successfully developed to compute the capacitance matrix of integrated-circuit interconnects. The OSMEI method uses the same mesh as MoM, but generates highly sparse matrices. The approach is verified by 2-D and 3-D examples with computing errors within 2/spl sim/4 percent.