On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists

摘要

This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces calculated from the study with model photoresist surfaces and surfactant solutions correlated with a maximum of pattern collapse reduction obtained in the photolithographic process.