Mechanical properties and structural characteristics of hydrogen incorporated carbon films synthesized by PIII-D

摘要

Amorphous hydrogenated carbon a-C:H thin films have become of great interest because of their possible applications in mechanics, optics and electronics. Wide band-gap a-C:H films have been proposed as a material suitable for light emitting devices and flat panel displays due to the photoluminescence efficiency they show even at room temperature. Hydrogenated carbon films were deposited on silicon wafers using plasma immersion ion implantation and deposition (PIII-D). Graphite was used as cathode material and hydrogen gas was selected as the working gas.