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Semiconductor metrics: conflicting goals or increasing opportunities?

机译:半导体指标:目标冲突或机会增加?

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In order to improve semiconductor manufacturing performance, companies typically utilize various metrics such as cycle time, throughput and yield. By tracking the progress of one or more of these metrics and setting achievement goals, many companies are able to make significant metric improvements. However, metric improvement is only beneficial if it results in actual manufacturing improvement. Metrics may be influenced by forces outside manufacturing, they may conflict with other metrics, or they may actually increase undesirable outcomes in the fab. This paper highlights some of the current problems with metric utilization in semiconductor fabs. Examples from industry and results using data from the Competitive Semiconductor Manufacturing Study at the University of California at Berkeley are given. We present some practical solutions, highlighting the Overall Equipment Effectiveness Teams at Texas Instruments which have been designed to minimize many of the semiconductor metric problems.
机译:为了提高半导体制造性能,公司通常利用各种指标,例如周期时间,吞吐量和良率。通过跟踪一个或多个这些指标的进度并设置成就目标,许多公司都可以对指标进行重大改进。但是,度量标准的改进只有在导致实际制造改进的情况下才是有益的。度量标准可能会受到制造外部力量的影响,它们可能与其他度量标准发生冲突,或者实际上可能会增加制造厂中不良的结果。本文重点介绍了半导体晶圆厂中度量利用方面的当前问题。给出了行业示例和使用加州大学伯克利分校竞争性半导体制造研究的数据得出的结果。我们提供了一些实用的解决方案,着重介绍了德州仪器(TI)的总体设备效率团队,该团队旨在最大程度地减少许多半导体度量问题。

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