Optimizing mask materials and laser pattern transfer processing for cheap MCM-L fast prototyping and special sensor applications

摘要

The need for fast and cheap prototyping becomes increasingly important in the production of MCMs. A prototyping process should fulfil a number of special requirements. A new approach has been developed for prototyping of MCM-Ls. It combines the advantages of laser direct writing and wet chemical etching. Several processing solutions have been developed and compared. The results of resolution and cross-section investigations, as well as morphology and material analysis results are shown in the paper. A special application of laser direct patterning for sensor purposes is also demonstrated.