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Realization of geometrically apodized phase masks for the production of apodized fiber gratings by UV exposure

机译:实现几何变迹相掩模以通过紫外线曝光生产变迹光纤光栅

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We describe the design methodology of geometric apodization and the fabrication of the apodized phase mask for UV-written fiber gratings. Concerning the two first diffraction orders used for UV exposure, the transmitted power is determined by the zero-order transmission, which is in turn determined by the variation of groove depth and ridge duty cycle. The simulated spectra for the zero-order output from a rectangular grating with a fixed ridge duty cycle shows that the position of the minimum zero-order transmission shifts with changing groove depth.
机译:我们描述了几何变迹的设计方法和UV写入光纤光栅的变迹相掩模的制造。关于用于紫外线曝光的两个第一衍射级,透射功率由零级透射率确定,而零级透射率又由凹槽深度和脊占空比的变化确定。来自具有固定脊占空比的矩形光栅的零阶输出的模拟光谱显示,最小零阶透射的位置随凹槽深度的变化而变化。

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