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A highly reliable 1T/1C ferroelectric memory

机译:高度可靠的1T / 1C铁电存储器

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A reliable 1T/1C ferroelectric RAM has been successfully fabricated with 1.2 /spl mu/m conventional CMOS technology by adopting IrO/sub 2/ electrode and the Ti-rich PZT thin film. The Ti-rich PZT capacitor shows no degradation of sensing Pr after integration process. After 1/spl times/10/sup 10/ cycling, the loss of remnant polarization was less than 5%. In thermally accelerated (150/spl deg/C) test condition, more than 14 /spl mu/C/cm/sup 2/ for both data 0 and data 1 sensing Pr values are obtained even after 10 years.
机译:通过采用IrO / sub 2 /电极和富含Ti的PZT薄膜,已经成功地以1.2 / spl mu / m的常规CMOS技术成功地制造了可靠的1T / 1C铁电RAM。富钛的PZT电容器在集成过程后没有显示出感测Pr的下降。在1 / spl次/ 10 / sup 10 /次循环后,剩余极化的损失小于5%。在热加速(150 / spl deg / C)测试条件下,即使经过10年,对于数据0和数据1仍获得了大于14 / spl mu / C / cm / sup 2 /的感测Pr值。

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