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Electron emission characteristics of pulsed laser deposited diamond-like films

机译:脉冲激光沉积类金刚石薄膜的电子发射特性

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Diamond like carbon (DLC) films possessing large electron emission capacity were obtained by pulsed laser deposition process. AFM morphologies and Raman spectra inferred that the proportion of SP/sup 3/-bonds is the predominating factor modifying the field emission characteristics. Large laser fluence and moderately high substrate temperature are thus required. The critical laser fluence needed to deposit DLC films with large emission current density was 10 J/cm/sup 2/ for 248 nn (KrF) laser beams and 4 J/cm/sup 2/ for 193 nn (ArF) laser beams, respectively. The highest emission current density was 80 /spl mu/LA/cm/sup 2/ for DLC films deposited at 400/spl deg/C using 248 nn laser beams and was 160 /spl mu/A/cm/sup 2/ for those grown at 200/spl deg/C using 193 nm laser beams. The turn on electric field was, respectively, 11.6 MV/m and 11.4 MV/m.
机译:通过脉冲激光沉积工艺获得了具有大电子发射能力的类金刚石碳(DLC)薄膜。 AFM形态学和拉曼光谱推断,SP / sup 3 /键的比例是影响场发射特性的主要因素。因此需要较大的激光通量和适度较高的基板温度。沉积具有大发射电流密度的DLC膜所需的临界激光通量分别为248 nn(KrF)激光束为10 J / cm / sup 2 /和193 nn(ArF)激光束为4 J / cm / sup 2 / 。对于使用248 nn激光束以400 / spl deg / C沉积的DLC膜,最高发射电流密度为80 / spl mu / A / cm / sup 2 /,对于DLC膜而言,最高发射电流密度为160 / spl mu / A / cm / sup 2 /。使用193 nm激光束在200 / spl deg / C下生长。开启电场分别为11.6MV / m和11.4MV / m。

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