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Impact of cell threshold voltage distribution in the array of flash memories on scaled and multilevel flash cell design

机译:闪存阵列中单元阈值电压分布对缩放和多级闪存单元设计的影响

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This paper, for the first time, describes the analytical expressions which explicitly relate single-cell characteristics to Flash array behaviour including statistical consideration. Since the bitline leakage current caused by over-erased cells and/or broad threshold voltage (Vt) distribution generates read/verify circuitry malfunctions and a degraded programming due to voltage drop, and charge-pump circuitry failure, this leakage are extensively analyzed to find the optimum operation biases, array Vt design, their allowed variations and bitline segmentation in the scaled multilevel cell generation.
机译:本文首次描述了将单电池特性与Flash阵列行为(包括统计考虑)明确相关的解析表达式。由于由过度擦除的单元和/或宽阈值电压(Vt)分布引起的位线泄漏电流会产生读/验证电路故障,并由于电压降和电荷泵电路故障而导致编程性能下降,因此,对该泄漏进行了广泛的分析以发现比例缩放多级单元生成中的最佳操作偏置,阵列Vt设计,允许的变化和位线分割。

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