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Electrical characteristics of CMOSFETs with gates crossing source/drain regions at 90/spl deg/ and 45/spl deg/

机译:栅极以90 / spl deg /和45 / spl deg /跨源/漏区的CMOSFET的电气特性

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The electrical characteristics of scaled CMOSFETs with gates crossing sources/drains at 90/spl deg/ and 45/spl deg/ are experimentally investigated using test devices fabricated by an n-well CMOS process with trench-isolation. The gain factors and the saturation drain-currents of n-MOSFETs are estimated by a simple correction theory which is derived by combining a center MOSFET and two edge MOSFETs. However, relatively large differences between the theoretical values and the experimental results are observed in p-MOSFETs with narrower widths less than the channel length. Other basic device parameters such as threshold voltages and subthreshold swings are qualitatively explained by the impurity profiles along the channel width direction, bird's beaks formed at the isolation-edges, and the change of channel length for narrow width 45/spl deg/ MOSFETs.
机译:使用通过沟槽隔离的n阱CMOS工艺制造的测试设备,通过实验研究了栅极在90 / spl deg /和45 / spl deg /交叉源极/漏极的比例缩放CMOSFET的电学特性。 n-MOSFET的增益因子和饱和漏极电流通过简单的校正理论估算,该理论是通过将中心MOSFET和两个边缘MOSFET相结合而得出的。然而,在宽度小于沟道长度的较窄宽度的p-MOSFET中,观察到了理论值和实验结果之间的较大差异。其他基本器件参数(例如阈值电压和亚阈值摆幅)由沿着沟道宽度方向的杂质分布,在隔离边缘形成的鸟嘴状以及窄宽度45 / spl deg / MOSFET的沟道长度的变化定性地说明。

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