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Dynamic measurement of the temperature characteristic of dielectric material for microwave application using photo thermal dielectric microscope

机译:使用光热介电显微镜动态测量微波应用介电材料的温度特性

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A new photo thermal technique for measuring the temperature characteristic of dielectric material for microwave application is proposed. It is based on the temperature characteristic of the dielectric constant of light irradiated material. When a dielectric material is illuminated with chopped light, an alternating variation of capacitance is caused by the heat produced due to light absorption and this variation is detectable with enough dynamic range and sensitivity. First, quantitative derivations are presented for the alternating capacitance variation in terms of the optical, thermal, dielectric and geometric parameters of the system. Next, a very high sensitive type of PTDM using a coaxial cavity resonator with operating frequency of microwave range is developed. Using this microscope,the temperature characteristics of the binary-system TiO/sub 2/-Bi/sub 2/O/sub 3/ dielectric ceramics for microwave application are successfully measured.
机译:提出了一种新的光热技术,用于测量微波应用介电材料的温度特性。它基于光辐照材料的介电常数的温度特性。当用切碎的光照射介电材料时,由于光吸收而产生的热量会引起电容的交替变化,并且可以在足够的动态范围和灵敏度下检测到这种变化。首先,根据系统的光学,热学,介电和几何参数,提出了交流电容变化的定量推导。接下来,开发了一种使用同轴谐振腔且具有微波范围工作频率的超高灵敏度类型的PTDM。使用该显微镜成功地测量了用于微波应用的二元体系TiO / sub 2 / -Bi / sub 2 / O / sub 3 /介电陶瓷的温度特性。

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