RIBE micro-fabrication of semiconductor photonic devices for micro-photonic integrated circuits

摘要

The authors present the reactive ion beam etching (RIBE) micro fabrication of miniature photonic devices, such as micro ring lasers, corner reflector arrays and star couplers. The key issue is to develop nanometer semiconductor fabrication processes with low induced damages. The proposed concept might be helpful for the size reduction in large scale integrated photonics.