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Test structures and measurement techniques for the characterization of the dynamic behaviour of CMOS transistors on wafer in the GHz range

机译:用于表征GHz范围内晶片上CMOS晶体管动态行为的测试结构和测量技术

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For high-precision modeling of dynamic transistor characteristics, the voltage dependence of the transistor capacitances has to be measured at different operating points and different frequencies. Test structures and measurement techniques are described which were used to determine the dynamic characteristics of CMOS transistors in the frequency range up to several gigahertz. By the application of a network analyzer, two measurement ports and multiple DC-biasing possibilities allow the determination of MOS transistor capacitances with all their voltage dependences. Layout and measurement results are presented.
机译:对于动态晶体管特性的高精度建模,必须在不同的操作点和不同频率下测量晶体管电容的电压依赖性。描述了测试结构和测量技术,用于确定频率范围内的CMOS晶体管的动态特性,直到几个Gigahertz。通过应用网络分析器,两个测量端口和多种直流偏置可能性允许确定具有其所有电压依赖性的MOS晶体管电容。提出了布局和测量结果。

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