The authors describe how a yield management system (YMS) could be designed to provide tools to quickly find and fix process and equipment defect problems in 16 Mbit DRAM IC manufacturing. The proposed system design consists of the KLA 2110 wafer inspection system (with sensitivity down to 0.25 mu m for 16 Mbit DRAM manufacturing), optical and SEM (scanning electron microscope) defect review stations, wafer prober stations, reticle inspectors, a dielectric failure detection system, a defect image storage unit, an analysis workstation, and a host computer where work-in-process and yield information is stored.
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机译：作者描述了如何设计良率管理系统（YMS），以提供工具来快速查找和修复16 Mbit DRAM IC制造中的工艺和设备缺陷问题。拟议的系统设计包括KLA 2110晶圆检查系统（对于16 Mbit DRAM生产，灵敏度低至0.25μm），光学和SEM（扫描电子显微镜）缺陷检查站，晶圆探测器站，标线检查器，电介质故障检测系统，缺陷图像存储单元，分析工作站和主机，其中存储了在制品和成品率信息。
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