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Electron Energy Distributions In Electron Cyclotron Resonance Plasmas for Materials Processing

机译：用于材料加工的电子回旋共振等离子体中的电子能量分布

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来源
《》|1991年|P.137-137|共1页
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作者
Yilin Weng; Kushner; M.J.;
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中图分类无线电电子学、电信技术;
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1. Detection of electron energy distribution function anisotropy in a magnetized electron cyclotron resonance plasma by using a directional Langmuir probe [J] . T. Shikama, H. Kitaoka, M. Hasuo Physics of plasmas . 2014,第7期

机译：使用定向朗缪尔探针检测磁化电子回旋共振等离子体中的电子能量分布函数各向异性
2. Study on the Distribution Control of Etching Rate and Critical Dimensions in Microwave Electron Cyclotron Resonance Plasmas for the Next Generation 450 mm Wafer Processing [J] . Kenji Maeda, Shinji Obama, Hitoshi Tamura, Japanese journal of applied physics . 2012,第8ISSUE2期

机译：下一代450 mm晶圆加工微波回旋共振等离子体中刻蚀速率和临界尺寸的分布控制研究
3. Influence of mixture compositions on ion energy distributions in Ar/N-2 electron cyclotron resonance plasma [J] . Zhang Y. C., Xie X. H., Li H., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2015,第Null期

机译：混合物组成对Ar / N-2电子回旋共振等离子体中离子能量分布的影响
4. Electron Energy Distributions In Electron Cyclotron Resonance Plasmas for Materials Processing [C] . Yilin Weng, Kushner M.J., Institute of Electric and Electronic Engineer IEEE International Conference on Plasma Science . 1991

机译：电子回旋谐振等离子体中的电子能量分布用于材料加工
5. Comparison of high-density electron cyclotron resonance and inductively coupled plasma sources for etching of electronic materials: New plasma etch regimes for electronic materials. [D] . Lee, Jewon. 1997

机译：用于电子材料蚀刻的高密度电子回旋共振和感应耦合等离子体源的比较：电子材料的新等离子体蚀刻方案。
6. Electronic and optoelectronic applications of solution-processed two-dimensional materials [O] . Jingyun Wang, Bilu Liu 2019

机译：固溶处理二维材料的电子和光电应用
7. Comments on “Measurement of the Anisotropic Energy Distribution of Electrons in an Electron Cyclotron Resonance Plasma” [O] . Igor Alexeff 1968

机译：关于“电子回旋共振等离子体中电子的各向异性能量分布的”测量“的评论
8. Plasma Instabilities and Waves Excited by An Anisotropic Energy Distribution Produced by Electron Cyclotron Resonance [R] . Shohet, J. L., Sprott, J. C., Seshadri, S. R. 1972

机译：电子回旋共振产生的各向异性能量分布激发等离子体不稳定性和波动

Electron Energy Distributions In Electron Cyclotron Resonance Plasmas for Materials Processing

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