首页> 外文会议>Mechanisms and principles of epitaxial growth in metallic systems >Real-Time X-ray Scatteirng Study of Surface Dynamics on Au(111) During Ar~+ Ion Irradiation
【24h】

Real-Time X-ray Scatteirng Study of Surface Dynamics on Au(111) During Ar~+ Ion Irradiation

机译:Ar〜+离子辐照过程中Au(111)表面动力学的实时X射线散射研究

获取原文
获取原文并翻译 | 示例

摘要

X-ray scattering is used to ivnestigate the surface dynamics on Au(111) during Ar~+ ion irradiation. During 500 eV Ar~+ ion irradiatiion, we observe the three regimes of step retraction, quasi-layer-by-layer removal and three dimensional rough erosion, analagous to molecular beam epitaxy. The quasi-layer-by-layer sputtering regime has been studied to identify similarities and differences in surface evolution during ion irradiation and molecular eam epitaxy. X-ray measurements suggest that 500 eV Ar~+ ion irradiation does not lead to stable adatom island formation. Also, in contrast to molecular beam epitaxy, adatom detachment and diffusion seems important in describing the surface kinetics during ion irradiation.
机译:X射线散射用于阐明Ar〜+离子辐照过程中Au(111)上的表面动力学。在500 eV Ar〜+离子辐照期间,我们观察到类似于分子束外延的三个阶段的逐步回缩,逐层去除和三维粗糙腐蚀。研究了准逐层溅射方案,以识别离子辐照和分子束外延过程中表面演变的相似性和差异。 X射线测量表明500 eV Ar〜+离子辐照不会导致稳定的吸附原子岛形成。而且,与分子束外延相反,在描述离子辐照过程中的表面动力学时,吸附原子的分离和扩散似乎很重要。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号