Department of Sciences, Alexandru loan Cuza University, 54 Lascar Catargi Street, 700107, lasi,Romania;
Faculty of Physics, Alexandru loan Cuza University, 11 Carol I Boulevard, 700506, lasi, Romania;
Faculty of Physics, Alexandru loan Cuza University, 11 Carol I Boulevard, 700506, lasi, Romania;
Faculty of Physics, Alexandru loan Cuza University, 11 Carol I Boulevard, 700506, lasi, Romania;
Faculty of Physics, Alexandru loan Cuza University, 11 Carol I Boulevard, 700506, lasi, Romania;
Faculty of Physics, Alexandru loan Cuza University, 11 Carol I Boulevard, 700506, lasi, Romania;
N-doped TiO_2; rutile; RF magnetron sputtering;
机译:射频磁控溅射法制备多晶锐钛矿和金红石型TiO_2薄膜及其表征
机译:射频磁控溅射制备TiO_2薄膜的表征及光催化活性
机译:射频功率和溅射压力对射频磁控溅射制备的TiO_2薄膜的结构和光学性能的影响
机译:RF磁控溅射制备的金红石N-掺杂TiO_2薄膜的表征
机译:通过直角磁控溅射制备的生物医学应用羟基磷灰石薄膜的表征。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:射频磁控溅射制备金红石型N掺杂TiO2薄膜的表征