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Effects of multi doped zones on the current-voltage characteristics and EL spectra in organic light emitting diodes

机译:多掺杂区对有机发光二极管电流-电压特性和EL光谱的影响

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The narrow rubrene-doped zones were located in the emitting layer, AlQ3. The effects of doped-zone width, position and zone number on the electroluminescence (EL) intensity of organic light emitting diodes (OLEDs) were studied. The current-voltage characteristics were also studied according to the trap charge limited (TCL) transport models. When the doped zone width increased, the EL intensity decreased dramatically due to the large trapping defects introduced by rubrene molecules. When a single doped zone is placed adjacent to the TPD/AlQ3 interface, the EL spectra have higher intensity. As the doped zone location moved away from the TPD/AlQ3 interface to the cathode, the conduction current decreased, the turn-on voltage increased and the EL efficiency decreased due to insufficient amount of holes can diffuse to the doped zone to recombine with trapped electrons in doped regions. Double and triple doped zones structures were used to fabricate the devices. The double doped-zone structure has the highest EL intensity. The emission intensity was more than 4 times higher than that of a single doped diode.
机译:窄的红宝石掺杂区位于发光层AlQ3中。研究了掺杂区宽度,位置和区数对有机发光二极管(OLED)的电致发光(EL)强度的影响。还根据陷阱电荷限制(TCL)传输模型研究了电流-电压特性。当掺杂区宽度增加时,由于红荧烯分子引入的大量俘获缺陷,EL强度急剧下降。当将单个掺杂区放置在与TPD / AlQ3界面相邻的位置时,EL光谱具有更高的强度。随着掺杂区位置从TPD / AlQ3界面移向阴极,导通电流减小,导通电压增加,并且由于空穴数量不足而导致的EL效率下降,可以扩散到掺杂区以与捕获的电子复合在掺杂区域。使用双和三掺杂区结构来制造器件。双掺杂区结构具有最高的EL强度。发射强度是单个掺杂二极管的4倍以上。

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