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LOG filter based inspection of Cluster Mura and Vertical-Band Mura on liquid crystal displays

机译:基于LOG过滤器的液晶显示器上簇Mura和垂直带Mura的检查

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摘要

In this paper, we propose the use of Laplacian of Gaussian (LOG) filters in the detection of Cluster Mura defects and Vertical-Band Mura defects on Liquid Crystal Displays. To detect Cluster Mura defects, 2-D LOG filters with their shapes matching the shapes of Cluster Mura are adopted. The optimal threshold for the detection of Cluster Mura is determined based on the SEMU formula. On the other hand, to detect Vertical-Band Mura, a 1-D LOG filter is used over the projected 1-D intensity profile to check if the variation tendency of the intensity profile is changed. The portions with inconsistently intensity variation are regarded as the portions where V-Band Muras occur. The simulation results demonstrate the LOG filters are very useful in the detection of Mura defects.
机译:在本文中,我们建议使用高斯拉普拉斯算子(LOG)过滤器检测液晶显示器上的簇Mura缺陷和垂直带Mura缺陷。为了检测Cluster Mura缺陷,采用了形状与Cluster Mura形状匹配的二维LOG滤波器。基于SEMU公式确定用于检测Cluster Mura的最佳阈值。另一方面,为了检测垂直频带Mura,在投影的一维强度分布图上使用一维LOG滤波器检查强度分布的变化趋势是否改变。强度变化不一致的部分被认为是发生V-Band Muras的部分。仿真结果表明,LOG过滤器对于检测Mura缺陷非常有用。

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