Lawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
rnLawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
rnLawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
rnLawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
rnLawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
rnLawrence Livermore National Laboratory 7000 East Avenue, Livermore, CA 94550, USA;
laser-induced damage; surface damage growth; fused silica;
机译:大孔径熔融石英光学元件在351 nm处的激光诱导损伤增长
机译:大孔径熔融石英光学元件在351 nm处的激光诱导损伤增长
机译:相位和幅度调制的非线性放大对厚光束在351 nm厚熔融石英光学器件的激光损伤的影响
机译:脉冲持续时间对351nm熔融二氧化硅表面的激光诱导型位点生长速率的影响
机译:超快激光诱导表面结构对不锈钢和熔融二氧化硅进行光学性质改性
机译:纳米石英激光在熔融石英光栅上的多波长生长
机译:HF / HNO $ _3 $和KOH溶液中的深湿蚀刻对351 nm熔融石英光学元件的抗激光损伤性和表面质量的影响