Determination of scattering losses in ArF~* excimer laser all-dielectric mirrors for 193 nm microlithography applications

摘要

The complete evaluation in the selection of coating designs for production of high performance mirrors must include the scattering losses that are associated with the thin film materials combination. This is especially true for deep ultraviolet [DUV] microlithography applications. Scattering loss data are presented at 193 nm for various coating material designs for operation in argon fluoride laser systems. For overall optimum performance tradeoffs of the spectral reflectance, environmental stability and pulsed laser irradiation lifetime survivability is also discussed.