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Improvement in ferroelectric properties of PZT thick films prepared by a modified sol-gel technique using low temperature laser annealing

机译:通过改进的溶胶-凝胶技术使用低温激光退火制备的PZT厚膜的铁电性能的改善

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摘要

Low temperature continuous-wave CO2 laser annealing technique was successfully adopted to fabricate ferroelectric Pb(Zr0.52Ti0.48)O3(PZT) thick films of different thickness on a Pt/Ti/SiO2/Si substrate using powder-mixing and sol-gel spin coating process. X-ray diffractometer (XRD) results showed that laser annealing provides an extremely efficient way to crystallize the materials. Films of type-I with thickness of 5μm showed cracks and rough surface morphology, indicating the importance of controlling interfacial stress and choosing appropriate size of the mixing powders. Better microstructure was observed in the type-II films. Type-II PZT film 5μm thick and annealed at 121Wcm2 exhibited better ferroelectric properties (Pr=15.86μCcm2) compared to type-IPZT film. The results indicated that porosity and electrical properties of thick films can be controlled using appropriate processing parameters, suggesting the applicability of continuous-wave CO2 laser annealing in the fabrication of PZT films.
机译:成功地采用低温连续波CO2激光退火技术,通过粉末混合和溶胶-凝胶法在Pt / Ti / SiO2 / Si衬底上制备了不同厚度的铁电Pb(Zr0.52Ti0.48)O3(PZT)厚膜。旋涂工艺。 X射线衍射仪(XRD)的结果表明,激光退火提供了一种使材料结晶的极其有效的方法。厚度为5μm的I型膜显示出裂纹和粗糙的表面形态,表明控制界面应力和选择合适尺寸的混合粉非常重要。在II型膜中观察到更好的微观结构。与IPZT型薄膜相比,厚度为5μm并在121Wcm2退火的II型PZT薄膜表现出更好的铁电性能(Pr =15.86μCcm2)。结果表明,可以通过适当的工艺参数来控制厚膜的孔隙率和电学性能,这表明连续波CO2激光退火在PZT膜的制造中的适用性。

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  • 来源
  • 会议地点 Hangzhou(CN);Hangzhou(CN)
  • 作者单位

    Shen-Da Tsai@Advanced Ceramics Laboratory, Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan 10672, Republic of China--M B Suresh@Advanced Ceramics Laboratory, Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan 10672, Republic of China--Chen-Chia Chou@Advanced Ceramics Laboratory, Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan 10672, Republic of China--;

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  • 正文语种 eng
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