Recent Advances in the Development of Ceria-Based Slurries for Inner Layer Dielectric CMP

摘要

New ceria-based slurries for ILD CMP have been developed that meet the extremely rigorous objectives necessary for the production of sub-90nm devices. The slurries are single component products with long shelf- and pot-lives. Control of both the ceria particle manufacture (solid state or solution grown) and the slurry formulation in-house is critical for the production of consistent product, to minimize lot-to-lot variability. Slurries with self-stopping behavior and high SHRR have been described in this paper. Recent work has led to slurries with both high SHRR and self-stopping capability and this will be reported in the near future.