A REVIEW OF CLUSTER ION BEAM PROCESS TECHNOLOGY

摘要

The impact of an accelerated cluster ion upon a target surface imparts very high energy densities into the impact area and produces non-linear effects that are not associated with the impacts of atomic ions. These unique characteristics of gas cluster ion (GCIB) bombardment have been found to offer potential for various industrial applications. Prospective applications for these effects include low energy ion implantation, high rate sputtering, surface cleaning and smoothing, and low temperature thin film formation. This paper reviews recent R&D trends of GCIB processes.