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CORROSION ELECTROCHEMISTRY of ALUMINUM AND TITANIUM ALLOYS in HALIDE ENVIRONMENTS

机译:卤化物环境中铝和钛合金的腐蚀电化学

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摘要

Linear potential sweeps of Ti and Ti-6-4, Al and 2024A1-T4 in 1M NaCl, NaBr and NaI and mixtures of the halides have been performed to obtain the relative pitting potentials of these metals in the presence of these aggressive anions. For Al and 2024A1-T4 pitting potentials increased in the order Cl~- < Br~- < I~- with more negative pitting potentials obtained for Al. The order was Br~- < I~- < Cl~- for Ti and Ti-6-4 with lower pitting potentials for Ti-6-4. On the other hand, in methanol solutions Ti in Cl~- had the most negative pitting potential with the order Cl~- < Br~- < I~-. Potential/current oscillatons were observed for Ti in bromide and iodide media. Analysis of this oscillatory behavior indicate clearly deterministic and not stochastic phenomena.
机译:已在1M NaCl,NaBr和NaI以及卤化物的混合物中进行了Ti和Ti-6-4,Al和2024A1-T4的线性电势扫描,以在这些侵蚀性阴离子存在下获得这些金属的相对点蚀电势。对于Al和2024A1-T4,点蚀电势以Cl _-

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