首页> 外文会议>International Symposium on Eco-Materials Processing and Design(ISEPD-8); 20070111-13; Kitakyushu(JP) >NO_X and SO_X Removal by Low Temperature Plasma-Photocatalysts Hybrid System
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NO_X and SO_X Removal by Low Temperature Plasma-Photocatalysts Hybrid System

机译:低温等离子体-光催化剂混合体系去除NO_X和SO_X

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We analyzed the effects of several process variables on removal efficiencies of NO and SO_2 by the low temperature plasma process combined with photocatalysts. The cylinder-wire type, dielectric barrier discharge process for plasma generation was used. The photocatalysts were coated onto the glass beads by dip-coating method. As the voltage applied to the plasma reactor increases, or as the pulse frequency of applied voltage increases, the NO and SO_2 removal efficiencies also increase. As the initial NO concentration decreases, or as the residence time increases, the NO and SO_2 removal efficiencies increase.
机译:我们分析了几种工艺变量对低温等离子体工艺结合光催化剂去除NO和SO_2效率的影响。使用圆柱线型,电介质阻挡层放电工艺来产生等离子体。通过浸涂法将光催化剂涂覆在玻璃珠上。随着施加到等离子体反应器的电压增加,或者随着施加电压的脉冲频率增加,NO和SO_2的去除效率也增加。随着初始NO浓度的降低或停留时间的增加,NO和SO_2的去除效率会提高。

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