Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography

机译：碳纳米管光刻技术研究碳纳米管光电器件

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摘要

Nano-Imprint Lithography (NIL) technology is presented to fabricate Carbon Nano-Tube (CNT) arrays for Field Emission (FE) and sensor devices by process control and optimization. Results reveal that the CNT arrays are high resolution and fidelity.

机译：提出了纳米压印光刻技术（NIL），以通过过程控制和优化来制造用于场发射（FE）和传感器设备的碳纳米管（CNT）阵列。结果表明，CNT阵列具有很高的分辨率和保真度。

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来源
《International Nano-Optoelectronic Workshop; 20070729-0811; Beijing and Lanzhou(CN)》|2007年|P.312-313|共2页
会议地点 Beijing and Lanzhou(CN)
作者
Hongzhong Liu; Yucheng Ding; Lei Yin; Bingheng Lu; Duowang Fan;
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作者单位

State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, People's Republic of China, 710049;

State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, People's Republic of China, 710;

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正文语种 eng
中图分类半导体技术;
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专利

1. HIGH DENSITY FLUOROCARBON PLASMA ETCHNING OF NEW RESISTS SUITABLE FOR NANO-IMPRINT LITHOGRAPHY [J] . F. Gabroiau Microelectronic Engineering . 2000,第1a4期

机译：高密度氟碳等离子体刻蚀适用于纳米印迹平版印刷的新电阻
2. Study on surface modification of silicon using CHF3/O2 plasma for nano-imprint lithography [J] . Kim Youngkeun, Kang Sungchil, Ham Youn-Hyun, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 2012,第3期

机译：CHF3 / O2等离子体用于纳米压印光刻的硅表面改性研究
3. Study on Polymer Materials Evaluation System for Nano-Imprint Lithography [J] . Atsushi Sekiguchi, Yoshiyuki Kono, Yoshihiko Hirai Journal of Photopolymer Science and Technology . 2005,第4期

机译：纳米压印光刻的高分子材料评价系统研究
4. Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography [C] . Liu, Hongzhong, Ding, . 2007

机译：碳纳米管光刻技术研究碳纳米管光电器件
5. Development and study of nano-imprint and electron beam lithography materials for semiconductor devices. [D] . Kim, Eui Kyoon. 2005

机译：用于半导体器件的纳米压印和电子束光刻材料的开发和研究。
6. From the Cover: Ten- to 50-nm-long quasi-ballistic carbon nanotube devices obtained without complex lithography [O] . Ali Javey, Pengfei Qi, Qian Wang, 2004

机译：从封面开始：无需复杂光刻即可获得10至50 nm长的准弹道碳纳米管器件
7. Study on Polymer Materials Evaluation System for Nano-Imprint Lithography [O] . Atsushi Sekiguchi, Yoshiyuki Kono, Yoshihiko Hirai 2005

机译：纳米压印光刻聚合物材料评价体系研究

Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography

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