首页> 外文会议>International Display Manufacturing Conference(IDMC 2002); 20020629-31; Seoul(KR) >Electron Emission Characteristics of The Porous Polycrystalline Silicon Diode
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Electron Emission Characteristics of The Porous Polycrystalline Silicon Diode

机译:多孔多晶硅二极管的电子发射特性

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It is estimated that a porous polysilicon (PPS) diode with a structure of Au/PPS-type Si operates as an efficient stable surface emitting cold cathode. 2.0 um of an nondoped polysilicon layer is formed on anheavily doped n-type silicon wafer and anodized in a solution of HF(50%) : ethanol = 1:1 under illumination by a 500 W tungsten lamp from a distance of 20 cm. The electron emission properties of the PPS diode were investigated as a function of anodizing condition such as anodizing current density. The electron emission trajectory was investigated, and it was also demonstrated their good uniformity in the emitting area.
机译:据估计,具有Au / PPS / n型Si结构的多孔多晶硅(PPS)二极管可作为有效的稳定表面发射冷阴极。在重掺杂的n型硅晶片上形成2.0 um的非掺杂多晶硅层,并在HF(50%):乙醇= 1:1的溶液中,在500 W钨灯的照射下,在20 cm的距离下进行阳极氧化。研究了PPS二极管的电子发射性能与阳极氧化条件(例如阳极氧化电流密度)的关系。研究了电子发射轨迹,并证明了它们在发射区域的良好均匀性。

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