INVESTIGATION OF Ti. Co AND Fe SILICIDES ON SIMOX MATERIALS

摘要

The fabrication of Ti, Co and Fe silicides on SIMOX materials have been investigated These multilayer structures have been synthesized by different method respectively. The physical properties and microstructure have been investigated. The experimental results show that TiSi_2 with a low sheet resistance of 4.5Ω/G, can be formed on the thin film SIMOX. An epitaxial CoSi_2 film has been obtained on SIMOX by a solid phase reaction of Co/Ti with Si overlayer of SIMOX. Semiconducting β-FeSi_2 film has been synthesized on SIMOX by solid phase epitaxy.