首页> 外文会议>International Conference on Silicon Carbide and Related Materials 2001 Pt.2 Oct 28-Nov 2, 2001 Tsukuba, Japan >N and p Type 6H-SiC Films for the Creation Diode and Triode Structure of Nuclear Particle Detectors
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N and p Type 6H-SiC Films for the Creation Diode and Triode Structure of Nuclear Particle Detectors

机译:用于核粒子探测器的二极管和三极管结构的N和p型6H-SiC膜

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摘要

As detectors were used diode and triode structure, obtained by magnetron sputtering of Ni on surface n and p type 6H-SiC films, grown by sublimation epitaxy in vacuum. Investigation of the detector parameters diode structure shows that irradiation with 1000 MeV proton doses of ~3·10~(14) cm~(-2) was initial stage of modification of SiC properties. In triode structure it was shown possibility signal amplification on the order of 50 times on short-range particles.
机译:作为探测器使用二极管和三极管结构,该结构通过在表面n和p型6H-SiC膜上通过Ni的磁控溅射法获得,并通过真空升华外延生长。对探测器参数二极管结构的研究表明,用1000 MeV质子剂量的〜3·10〜(14)cm〜(-2)辐照是改变SiC性能的初始阶段。在三极管结构中,显示了对短程粒子放大50倍左右的可能性信号。

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