首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Influence of excited states of Mg acceptors on hole concentration in GaN
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Influence of excited states of Mg acceptors on hole concentration in GaN

机译:Mg受体的激发态对GaN中空穴浓度的影响

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The influence of the excited states of the acceptors on the hole concentration in p-type GaN is investigated theoretically and experimentally. Using the temperature dependence of the hole concentration p(T) in Mg-doped GaN epilayers, a distribution function suitable for Mg acceptors is examined. It is found that the influence of their excited states on p(T) as well as the temperature dependence of the average acceptor level cannot be ignored, when the acceptor level is deep ( ≥ 150 meV). Moreover, it is elucidated that due to their excited states the ionization efficiency of acceptors is higher at elevated temperatures than the ionization efficiency expected from the Fermi-Dirac distribution function.
机译:从理论和实验上研究了受主激发态对p型GaN空穴浓度的影响。使用掺杂Mg的GaN外延层中空穴浓度p(T)的温度依赖性,研究了适用于Mg受体的分布函数。发现当受主能级很深(≥150 meV)时,它们的激发态对p(T)的影响以及平均受主能级的温度依赖性都不能忽略。此外,已经阐明,由于它们的激发态,在高温下受体的电离效率比费米-狄拉克分布函数预期的电离效率更高。

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