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The AFM Measuring Technology and Image Analysis in the Fabrication Process of Diffraction Grating

机译:衍射光栅制造过程中的原子力显微镜测量技术和图像分析

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Aiming at the topographic characteristics of the diffraction grating and the working principle of AFM, the measuring technology including the measures to eliminate the artifacts and image analysis in the grating fabrication process are given. Extended abstract AFM (Atomic Force Microscopy) is an important measuring instrument which has nanometer resolution. The diffraction grating is the key optic component in the spectral instrument. The AFM measuring technology can be introduced to acquire the topography of the diffraction grating in the fabrication process of grating.
机译:针对衍射光栅的形貌特征和原子力显微镜的工作原理,提出了测量技术,包括消除光栅制造过程中的伪影和图像分析的措施。扩展的抽象原子力显微镜(AFM)是具有纳米分辨率的重要测量仪器。衍射光栅是光谱仪中的关键光学组件。在光栅的制造过程中,可以引入AFM测量技术来获取衍射光栅的形貌。

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